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タイトル: Nanometer-Scale Deposition of Metal Plating Using a Nanopipette Probe in Liquid Condition
著者: Ito, So
Iwata, Futoshi
掲載誌名: Japanese Journal of Applied Physics
出版者: Japan Society of Applied Physics
巻: 50
号: 8
開始ページ: 08LB15
出版日付: 2011-08-22
権利: © 2011 The Japan Society of Applied Physics
NDC: 549
抄録: We describe a novel technique of a local metal plating using an atomic force microscope (AFM) with a nanopipette probe in liquid condition. A glass nanopipette, filled with CuSO4 electrolyte solution, was used as the AFM probe. An electrode wire inside the electrolyte-filled nanopipette and the conductive surface of a Au-sputtered glass slide were employed as the anode and the cathode, respectively. To avoid drying of the nanopipette solution and clogging of the probe-edge aperture, the edge of the nanopipette was immersed in the same electrolyte solution in a liquid cell placed on the Au substrate. As for controlling the distance between the probe edge and the surface in the liquid, the nanopipette probe glued on a tuning fork quartz crystal resonator was vertically oscillated to use a method of frequency modulation in tapping-mode. By utilizing the probe–surface distance control during the deposition, nanometer-scale Cu dots were successfully deposited on the Au surfaces without diffusion of the deposition even in the liquid condition. This technique of local deposition in a liquid would be applicable for various fields such as the fabrication of micro/nanometer-scale devices and the arrangement of biological samples.
ISSN: 00214922 OPAC
E-ISSN: 13474065 OPAC
出版者DOI: 10.1143/JJAP.50.08LB15   
NII書誌ID: AA12295836 OPAC ciniib
バージョン: author
出現コレクション:05. 雑誌論文・記事(Journal Article, Article, Preprint)

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