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タイトル: Optimization of Amino Group Introduction onto Polyurethane Surface Using Ammonia and Argon Surface-Wave Plasma
著者: Ogino, Akihisa
Noguchi, Suguru
Nagatsu, Masaaki
掲載誌名: Japanese Journal of Applied Physics
出版者: Japan Society of Applied Physics
巻: 50
号: 8
開始ページ: 08JF06
出版日付: 2011-08-22
権利: © 2011 The Japan Society of Applied Physics
NDC: 427
抄録: Effects of hydrogen and NHx species produced by a surface-wave excited Ar/NH3 plasma on amino group introduction onto a polyurethane surface were studied by comparing the results of optical emission spectroscopy (OES) and primary amino group concentration. For increasing the introduced primary amino group concentration on the surface, the monitoring and control of the concentration of NHx species as a precursor and that of atomic hydrogen as an etchant are important. From the results of X-ray photoelectron spectroscopy (XPS) and OES analysis, the primary amino group concentration and the emission intensity of Hβ reached a minimum and a maximum, respectively, at around 25% NH3 gas mixture ratio. An excess of atomic hydrogen over nitrogen grafting species might reduce the amino group selectivity and N/C surface density. To increase the concentration of NHx species produced in a plasma, the enhancement of NHx generation by the Penning effect was examined by adding Ar gas. As a result, the primary amino group concentration increased with the increase in the emission intensity of NH. However, the amino group selectivity became lower than that in the case of pure NH3 plasma treatment since not only the primary amino group concentration but also the secondary and tertiary amino group concentrations increased with the enhanced decomposition of NH3 by Ar metastables.
ISSN: 00214922 OPAC
E-ISSN: 13474065 OPAC
出版者DOI: 10.1143/JJAP.50.08JF06   
NII書誌ID: AA12295836 OPAC ciniib
バージョン: author
出現コレクション:11. 雑誌論文・記事(Journal Article, Article, Preprint)

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Others By: Ogino, Akihisa (荻野, 明久) (オギノ, アキヒサ) -- Noguchi, Suguru -- Nagatsu, Masaaki (永津, 雅章) (ナガツ, マサアキ)



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